Atomic layer deposition (ALD) uses are extending beyond electronics to include everything from batteries and catalysts to fuel cells and photovoltaic solar panels.

"In just the past few years, there has been an explosion in the number of ALD applications," Gary Rubloff, a materials science professor from the University of Maryland, told Chemical and Engineering News (C&EN).

The process involves producing an ultrathin and defect-free electrically insulating metal oxide coating on closely spaced microscopic features, such as in semiconductors.

Films of platinum, palladium, ruthenium and other metals may also be used.

One benefit of ALD is that scientists are able to produce tailored metal catalyst particles.

Researchers from Argonne National Laboratory demonstrated that palladium particles ranging in size from less than one nanometre to two nanometres can be prepared in uniform-sized batches by adjusting ALD parameters.

C&EN notes that for some systems, particle size can have a significant effect on catalytic activity, making this variation on ALD useful for many industrial purposes.

Source:

Making Films One Layer At A Time (01/08/11) 

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